Patent · US Active

Substrate positioning for deposition machine

US11679602B2 · kind B2 · utility

1Cited by
3References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 29, 2020
Grant dateJun 20, 2023
Priority date
Expiry dateJul 3, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K71/135
  • WIPO fieldTextile and paper machines
  • WIPO sectorMechanical engineering

Abstract

A deposition device is described. The deposition device has a substrate support and a laser imaging system disposed to image a portion of a substrate positioned on the substrate support. The laser imaging system comprises a laser source and an imaging unit, and is coupled to a deposition assembly disposed across the substrate support.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.