Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern
US11680040B2 · kind B2 · utility
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3References
14Claims
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Key dates
| Filing date | Oct 11, 2019 |
| Grant date | Jun 20, 2023 |
| Priority date | — |
| Expiry date | Oct 21, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present specification provides a compound, a photoresist composition comprising the same, a photoresist pattern comprising the same, and a method for preparing a photoresist pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.