Patent · US Active

Resin, resist composition and method for producing resist pattern

US11681224B2 · kind B2 · utility

0Cited by

7References

12Claims

0Family size

Assignee

SUMITOMO CHEMICAL COMPANY, LIMITED · JP

Inventors

Mutsuko Higo · Osaka, JP
Shingo Fujita · Osaka, JP
Koji Ichikawa · Kaisei, JP

Key dates

Filing date	Aug 23, 2019
Grant date	Jun 20, 2023
Priority date	—
Expiry date	Jan 19, 2042

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/38
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Disclosed are a resin containing a structural unit represented by formula (I), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a2-A), and a resist composition including the same:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.