Measuring method
US11682179B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 6, 2021 |
| Grant date | Jun 20, 2023 |
| Priority date | — |
| Expiry date | Dec 6, 2041 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A measuring method includes the following. An image to be tested of an object to be tested with a first characteristic pattern is formed and is copied to form multiple images to be tested. The multiple images to be tested are superimposed to form a to-be-tested overlapped image which has the multiple first characteristic patterns. A reference image of a reference object with a second characteristic pattern is formed and is copied to form multiple reference images. The multiple reference images are superimposed to form a reference overlapped image which has the multiple second characteristic patterns. The to-be-tested overlapped image and the reference overlapped image are superimposed to generate a virtual moiré image having a moiré pattern different from the multiple first characteristic patterns and the multiple second characteristic patterns.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.