Etchant composition and method of manufacturing display apparatus by using the same
US11683975B2 · kind B2 · utility
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26Claims
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Key dates
| Filing date | Nov 19, 2020 |
| Grant date | Jun 20, 2023 |
| Priority date | — |
| Expiry date | Mar 26, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K2102/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An etchant composition includes an inorganic acid compound of about 8 wt % to about 15 wt %, a sulfonic acid compound of about 2.5 wt % to about 8 wt %, a sulfate compound of about 6 wt % to about 14 wt %, an organic acid compound of about 40 wt % to about 55 wt %, a metal or metal salt of about 0.01 wt % to about 0.06 wt %, and water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.