Patent · US Active

Covalent organic framework patterning on substrates

US11685657B2 · kind B2 · utility

0Cited by

3References

22Claims

0Family size

Assignee

University of Pittsburgh—Of the Commonwealth System of Higher Education · US

Inventors

Alexander Star · Pittsburgh, US
David R. White · Pittsburgh, US

Key dates

Filing date	Oct 23, 2020
Grant date	Jun 27, 2023
Priority date	—
Expiry date	Mar 17, 2041

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB82Y40/00
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

A method of forming a pattern in a substrate material includes positioning a layer of a covalent organic framework polymer including nanoscale holes or pores therein over the substrate material as a template having nanoscale holes or pores therein to form a templated assembly and applying an etching process to the templated assembly.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.