Near-infrared curable ink composition and production method thereof, near-infrared cured layer, and stereolithography
US11685839B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 19, 2018 |
| Grant date | Jun 27, 2023 |
| Priority date | — |
| Expiry date | Apr 6, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB33Y10/00
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A near-infrared curable ink composition on a predetermined substrate that has excellent adhesion to the substrate when irradiated with near-infrared rays and cured, a near-infrared curable film obtained from the near-infrared curable ink composition, and stereolithography using the near-infrared curable ink composition, and contains composite tungsten oxide fine particles as near-infrared absorbing fine particles and uncured thermosetting resin, wherein the composite tungsten oxide fine particles have a XRD peak top intensity ratio value of 0.13 or more based on a XRD peak intensity ratio value of 1 on plane (220) of a silicon powder standard sample (640c produced by NIST).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.