Scan patterns for lidar systems
US11686821B2 · kind B2 · utility
0Cited by
89References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 22, 2019 |
| Grant date | Jun 27, 2023 |
| Priority date | — |
| Expiry date | Apr 27, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S17/931
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system includes a first lidar sensor and a second lidar sensor, where each lidar sensor includes a scanner configured to direct a set of pulses of light along a scan pattern and a receiver configured to detect scattered light from the set of light pulses. The scan patterns are at least partially overlapped in an overlap region. The system further includes an enclosure, where the first lidar sensor and the second lidar sensor are contained within the enclosure. Each scanner includes one or more mirrors, and each mirror is driven by a scan mechanism.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.