Laser-sustained plasma light source with gas vortex flow
US11690162B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 6, 2021 |
| Grant date | Jun 27, 2023 |
| Priority date | — |
| Expiry date | Sep 2, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J61/52
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A laser-sustained plasma (LSP) light source with vortex gas flow is disclosed. The LSP source includes a gas containment structure for containing a gas, one or more gas inlets configured to flow gas into the gas containment structure, and one or more gas outlets configured to flow gas out of the gas containment structure. The one or more gas inlets and the one or more gas outlets are arranged to generate a vortex gas flow within the gas containment structure. The LSP source also includes a laser pump source configured to generate an optical pump to sustain a plasma in a region of the gas containment structure within an inner gas flow within the vortex gas flow. The LSP source includes a light collector element configured to collect at least a portion of broadband light emitted from the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.