Patent · US Active

Friction polishing device for polymer filament

US11691240B1 · kind B1 · utility

0Cited by
2References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 18, 2019
Grant dateJul 4, 2023
Priority date
Expiry dateMar 29, 2042

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24D13/145
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A polishing device for polishing bristles includes a grinding surface and a friction material thereon, the friction material having aramid fibers or pulp bonded with a polyimide resin.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.