Photoacid generator, photoresist composition including the same, and method of preparing the photoacid generator
US11693315B2 · kind B2 · utility
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2References
20Claims
0Family size
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Key dates
| Filing date | Apr 23, 2021 |
| Grant date | Jul 4, 2023 |
| Priority date | — |
| Expiry date | Oct 21, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.