Imaging system comprising beam guidance element with high solarization resistance in the visible spectral range
US11698577B2 · kind B2 · utility
0Cited by
4References
14Claims
0Family size
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Key dates
| Filing date | May 28, 2021 |
| Grant date | Jul 11, 2023 |
| Priority date | — |
| Expiry date | Dec 30, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/04
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An imaging system includes at least one laser light source having a wavelength in the visible spectral range and a beam guidance element with high solarization resistance at high beam power densities. The invention also relates to the use of the imaging system, in particularly in projectors and in material processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.