Method and system for localized heating by illumination of patterned thin films
US11701661B2 · kind B2 · utility
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8Claims
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Assignee
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Key dates
| Filing date | Oct 15, 2019 |
| Grant date | Jul 18, 2023 |
| Priority date | — |
| Expiry date | Jan 22, 2041 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01L2400/0487
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
This disclosure describes various reaction vessel configurations that include a housing component; a reaction chamber defined by the housing component; and a light absorbing layer conforming to a portion of an interior-facing surface of the housing component that defines the reaction chamber, the light absorbing layer comprising multiple discrete regions. An energy source may direct light at one or more of the discrete regions of the light absorbing layer so as to heat the discrete regions and ultimately heat a solution within a reaction chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.