Self assembled patterning using patterned hydrophobic surfaces

US11702695B2 · kind B2 · utility

Assignee

• Illumina, Inc. · US

Inventors

• Yir-Shyuan Wu · Fremont, US
• Yan-You Lin · Fremont, US
• M. Shane Bowen · Encinitas, US
• Cyril Delattre · San Diego, US
• Fabien Abeille · Grenoble, FR
• Tarun Khurana · San Diego, US
• Arnaud Rival · St-Estève, FR
• Poorya Sabounchi · Pleasant Hill, US
• Dajun Yuan · San Diego, US
• Maria Candelaria Rogert Bacigalupo · Encinitas, US

Key dates

• Filing date: May 5, 2022
• Grant date: Jul 18, 2023
• Expiry date: May 5, 2042

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/405
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Embodiments provided herewith are directed to self-assembled methods of preparing a patterned surface for sequencing applications including, for example, a patterned flow cell or a patterned surface for digital fluidic devices. The methods utilize photolithography to create a patterned surface with a plurality of microscale or nanoscale contours, separated by hydrophobic interstitial regions, without the need of oxygen plasma treatment during the photolithography process. In addition, the methods avoid the use of any chemical or mechanical polishing steps after the deposition of a gel material to the contours.