Patent · US Active

Concentric flow reactor

US11702761B2 · kind B2 · utility

0Cited by
7References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 13, 2021
Grant dateJul 18, 2023
Priority date
Expiry dateMay 4, 2041

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T117/102
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A gas phase nanowire growth apparatus including a reaction chamber, a first input and a second input. The first input is located concentrically within the second input and the first and second input are configured such that a second fluid delivered from the second input provides a sheath between a first fluid delivered from the first input and a wall of the reaction chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.