High flow differential cleaning system
US11707772B2 · kind B2 · utility
0Cited by
8References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 23, 2020 |
| Grant date | Jul 25, 2023 |
| Priority date | — |
| Expiry date | Sep 8, 2040 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P10/25
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A high flow differential cleaning system uses a source of pressurized compressed dry gas to pressurize a holding tank. A component to be cleaned is securely loaded and oriented against a blast plate designed specifically for the desired pressure, flow, and volume. A fast-actuated valve system opens to direct high volumes of pressurized gas from a holding tank through and around the component(s) held within the cleaning chamber for the removal of remnant powder and foreign particles from interior cavities as well as exterior component surfaces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.