Projection of patterned and flood illumination
US11710945B2 · kind B2 · utility
2Cited by
40References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 6, 2021 |
| Grant date | Jul 25, 2023 |
| Priority date | — |
| Expiry date | Nov 6, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/02253
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optoelectronic apparatus includes a heat sink, which is shaped to define a base, a first platform at a first elevation above the base, and a second platform alongside the first platform at a second elevation above the base, which is different from the first elevation. A first monolithic emitter array is mounted on the first platform and is configured to emit first optical beams. A second monolithic emitter array is mounted on the second platform and is configured to emit second optical beams. An optical element is configured to direct both the first and the second optical beams toward a target region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.