Stereolithography method
US11718028B2 · kind B2 · utility
0Cited by
12References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 9, 2020 |
| Grant date | Aug 8, 2023 |
| Priority date | — |
| Expiry date | Dec 30, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29L2031/7536
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The present invention relates to a stereolithography method, comprising the steps of receiving a light-curing suspension (100) comprising filler particles (103) in a tray (105); adjusting the light-curing suspension by means of a build platform (107) to a layer thickness with respect to a bottom (109) of the tray (105) which is less than the diameter of the filler particles (103); and selectively curing the adjusted layer thickness of the suspension by means of light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.