Apparatus for generating extreme ultraviolet light and lithography apparatus including the same
US11720027B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 23, 2021 |
| Grant date | Aug 8, 2023 |
| Priority date | — |
| Expiry date | Aug 23, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70933
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An extreme ultraviolet (EUV) light generating apparatus includes a vessel including a first end and a second end opposite to each other and providing an internal space extending from the first end to the second end, a concave mirror adjacent to the first end of the vessel, a droplet generator supplying a droplet to the internal space of the vessel, a laser light source irradiating a laser beam to cause the droplet to emit EUV light, and a gas jet receiving a flow control gas and spraying the received flow control gas into the internal space of the vessel. The gas jet includes a ring-shaped main body including nozzles spaced apart from one another in a circumferential direction. The nozzles spray the received flow control gas in a downward direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.