Patent · US Active

Machine learning for quantum material synthesis

US11721095B2 · kind B2 · utility

0Cited by

1References

20Claims

0Family size

Assignee

RAYTHEON BBN TECHNOLOGIES CORP. · US

Inventors

Kin Chung Fong · Lexington, US
Man-Hung Siu · Lexington, US
Zhuolin Jiang · Lo Wu, CN

Key dates

Filing date	Nov 22, 2022
Grant date	Aug 8, 2023
Priority date	—
Expiry date	Nov 22, 2042

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB82Y10/00
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

A method for classifying images of oligolayer exfoliation attempts. In some embodiments, the method includes forming a micrograph of a surface, and classifying the micrograph into one of a plurality of categories. The categories may include a first category, consisting of micrographs including at least one oligolayer flake, and a second category, consisting of micrographs including no oligolayer flakes, the classifying comprising classifying the micrograph with a neural network.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.