System and method for absorbing moisture within a face mask
US11723421B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 23, 2017 |
| Grant date | Aug 15, 2023 |
| Priority date | — |
| Expiry date | Dec 13, 2038 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB32B2571/00
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A face mask (100) may comprise at least one layer of filtration material (218) configured to filter one or more harmful substances from the air breathed by a user; at least one layer of absorbent material (214) configured to absorb moisture exhaled by the user, wherein the at least one layer of absorbent material (214) spans the entire inner surface area of the mask (100); at least one layer of waterproof material (216) located between the at least one layer of filtration material (218) and the at least one layer of absorbent material (214) configured to prevent moisture from the absorbent material from contacting the filtration material; and at least one layer of anti-bacterial material (212) located adjacent to the at least one layer of absorbent material (214) and forming the inner surface of the mask (100). The face mask (100) can absorb moisture exhaled by a user.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.