Patent · US Active

Nozzle and applicator system comprising the same

US11724266B2 · kind B2 · utility

0Cited by
12References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 9, 2018
Grant dateAug 15, 2023
Priority date
Expiry dateFeb 15, 2040

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB05C11/1028
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

An applicator system for applying a material to a substrate is disclosed, the applicator system having a nozzle assembly (28) that includes a nozzle having a nozzle head (108). The nozzle assembly (28) also includes a baffle plate (101) including a cutout (144) that extends through the baffle plate (101), where the baffle plate (101) is received by the nozzle head (108) such that the nozzle head (108) and the baffle plate (101) define a cavity. The nozzle assembly (28) further includes a cover plate (102) attached to the nozzle head (108) such that the cover plate (102) secures the baffle plate (101) within the nozzle head (128), where an outlet passage is defined between the baffle plate (101) and the cover plate (102), the outlet passage being fluidly connected to the cavity through the cutout (144) of the baffle plate (101).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.