Low-profile intercranial device with enhancing grounding to ensure proper impedance measurements
US11730954B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 13, 2022 |
| Grant date | Aug 22, 2023 |
| Priority date | — |
| Expiry date | Apr 13, 2042 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61N1/0529
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A low-profile intercranial device adapted for housing a functional neurosurgical implant in manner providing for convenient and reliable grounding to ensure proper impedance measurements includes a static cranial implant including a base cranial implant member including an outer first surface, an inner second surface, and a recess shaped and dimensioned for receiving a functional neurosurgical implant. The low-profile intercranial device includes a plurality of fluid passageways extending between the inner second surface and the recess allowing for the flow of bodily fluid between an external environment of the base cranial implant member and a cavity defined by the recess.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.