Patent · US Active

Method and apparatus for feeding material into a plasma

US11731195B2 · kind B2 · utility

0Cited by
7References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 24, 2021
Grant dateAug 22, 2023
Priority date
Expiry dateSep 24, 2041

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB33Y70/00
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

An apparatus for providing material feedstock into a plasma of a plasma torch includes a material feeding device having an input end and an output end. The output end of the material feeding device extends at least partially around the periphery of a plasma generated near the output end of the plasma torch. The material feeding device is oriented at an angle with respect to a central axis of the plasma torch.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.