Patent · US Active

Silicon-containing underlayers

US11733609B2 · kind B2 · utility

0Cited by
1References
13Claims
0Family size

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Inventors

Key dates

Filing dateJul 8, 2021
Grant dateAug 22, 2023
Priority date
Expiry dateAug 30, 2041

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09D143/04
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.