System and method for harmonic modulation of standing wavefields for spatial focusing, manipulation, and patterning
US11738368B2 · kind B2 · utility
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23Claims
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Key dates
| Filing date | Jun 19, 2019 |
| Grant date | Aug 29, 2023 |
| Priority date | — |
| Expiry date | Jun 29, 2042 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB06B2201/76
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An system, and method are disclosed for harmonic modulation of standing wavefields for spatial focusing, manipulation, and patterning of particles, cells, powders, aerosols, colloids, and solids using a multifrequency wave source, a chamber a control module and an analysis module to generate standard wavefields useful for tissue engineering, micro fabrication, therapeutic treatment, and diagnostic tests.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.