Patent · US Active

Conductive sputter targets with silicon, zirconium and oxygen

US11739415B2 · kind B2 · utility

0Cited by

3References

8Claims

0Family size

Assignee

SOLERAS ADVANCED COATINGS BV · BE

Inventors

Ignacio CARETTI GIANGASPRO · Ekeren, BE
Wilmert De Bosscher · Drongen, BE
David Karel DEBRUYNE · Wondelgem, BE
Guy Gobin · Oostende, BE
Freddy FACK · Mariakerke, BE
Hubert ELIANO · Scheldewindeke, BE

Key dates

Filing date	Nov 12, 2019
Grant date	Aug 29, 2023
Priority date	—
Expiry date	Jul 8, 2040

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC04B2235/96
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A target for sputtering comprises SiZrxOy wherein x is higher than 0.02 but not higher than 5, and y is higher than 0.03 but not higher than 2*(1+x), wherein the target has an XRD pattern with silicon 2-theta peak at 28.29°+/−0.3°, or a tetragonal phase ZrO2 2-theta peak at 30.05°+/−0.3°. The target has a low resistivity, below 1000 ohm·cm, preferably below 100 ohm·cm, more preferably below 10 ohm·cm, even lower than 1 ohm·cm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.