LC/MS adduct mitigation by vapor deposition coated surfaces
US11740211B2 · kind B2 · utility
1Cited by
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17Claims
0Family size
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Key dates
| Filing date | Jan 15, 2021 |
| Grant date | Aug 29, 2023 |
| Priority date | — |
| Expiry date | Mar 27, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2030/8831
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present disclosure discusses a method of separating a sample (e.g., small organic acid metabolite) including coating a flow path of a chromatographic system. The coating along the flow path is vapor deposited and prevents or severely decreases metal interactions between the metallic chromatographic system and the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.