Display device, method for forming a pattern and method for manufacturing display device
US11740526B2 · kind B2 · utility
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9Claims
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Key dates
| Filing date | Apr 5, 2022 |
| Grant date | Aug 29, 2023 |
| Priority date | — |
| Expiry date | Apr 5, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/1201
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A display device includes a thin film transistor on a base substrate and a signal wiring electrically connected to the thin film transistor. The signal wiring includes a main conductive layer including copper, and a capping layer including titanium the capping layer overlapping a portion of an upper surface of the main conductive layer. The signal wiring has a taper angle in a range of about 70° to about 90°. A thickness of the capping layer is in a range of about 100 Å to about 300 Å, and a thickness of the main conductive layer is in a range of about 1,000 Å to about 20,000 Å.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.