Masked face recognition method
US11741751B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 14, 2021 |
| Grant date | Aug 29, 2023 |
| Priority date | — |
| Expiry date | Feb 11, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V40/173
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Provided is a face recognition method comprising acquiring a masked face image including a masked region and an un-masked region; obtaining an image feature from the masked face image; inputting the image feature to a pre-trained segmentation model to automatically estimate a feature of the masked region; and refining the image feature using the estimated feature of the masked region, wherein the refining step comprising focusing on a feature of the un-masked region and discarding the estimated feature of the masked region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.