Patent · US Active

Method for producing water-insoluble quantum dot patterns

US11745529B2 · kind B2 · utility

0Cited by
3References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 18, 2018
Grant dateSep 5, 2023
Priority date
Expiry dateJul 14, 2040

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB41M3/144
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present invention relates to a method for producing water-insoluble quantum dot patterns on and/or within a substrate. The method comprises a step of depositing a deliquescent salt, quantum dots and an acid or salt thereof onto at least one surface region of a substrate such that the deliquescent salt, the quantum dots and the acid or salt thereof are at least partially contacted to form said at least one water-insoluble pattern.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.