Chemical vapor deposition of thick inorganic coating on a polarizer
US11746418B2 · kind B2 · utility
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Key dates
| Filing date | Nov 5, 2019 |
| Grant date | Sep 5, 2023 |
| Priority date | — |
| Expiry date | Jan 10, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/3025
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Thick, inorganic coatings can be deposited on a polarizer by chemical vapor deposition. In one embodiment, the method can comprise activating a surface of the polarizer with an oxygen plasma in an oven; injecting a solution including tetrakis(dimethylamino)silane dissolved in cyclohexane and water into the oven; and vapor depositing silicon dioxide onto the polarizer. These three steps can be repeated multiple times until desired thickness is attained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.