Patent · US Active

Holding system for supporting a wafer and an optical element conformed so as to form an optical system and a method for forming such optical system

US11752712B2 · kind B2 · utility

0Cited by
4References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 13, 2019
Grant dateSep 12, 2023
Priority date
Expiry dateAug 18, 2039

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02F1/294
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Disclosed is a holding system for supporting a wafer having a first surface, a second surface and a third surface joining the first and second surfaces, and an optical element having a first surface, a second surface and a third surface joining the first and second surfaces, the holding system including: a support including first support unit configured to support the second and/or third surface of the wafer and second support unit configured to support the second and/or third surface of the optical element; a positioning unit configured to position the second surface of the wafer relative to the first surface of the optical element; and a mechanical unit configured to move the first and second support units one relative to the other so as to move the second surface of the wafer and the first surface of the optical element to form an optical system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.