Processor frequency improvement based on antenna optimization
US11754615B2 · kind B2 · utility
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3References
20Claims
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Key dates
| Filing date | Sep 21, 2021 |
| Grant date | Sep 12, 2023 |
| Priority date | — |
| Expiry date | Feb 10, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2119/12
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method is provided to increase processor frequency in an integrated circuit (IC). The method includes identifying a gate included in the IC, the gate having a gate threshold voltage and performing a plasma process to form an antenna signal path in signal communication with the gate. The method further comprises adjusting the plasma process or circuit design to increase plasma induced damage (PID) applied to the gate so as to alter the gate threshold voltage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.