Optical diffuser and its method of manufacture
US11754758B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 22, 2021 |
| Grant date | Sep 12, 2023 |
| Priority date | — |
| Expiry date | Sep 22, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/0268
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods of manufacture of an optical diffuser. In one embodiment, an optical diffuser is formed by providing a wafer including a silicon slice of which an upper face is covered with a first layer made of a first material itself covered with a second layer made of a second selectively etchable material with respect to the first material. The method further includes forming openings in the second layer extending up to the first layer and filling the openings in the second layer with a third material. The method yet further includes bonding a glass substrate to the wafer on the side of its upper face and removing the silicon slice.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.