Method and apparatus for cleaning medical instruments and for detecting residue thereon
US11759100B2 · kind B2 · utility
0Cited by
3References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 26, 2020 |
| Grant date | Sep 19, 2023 |
| Priority date | — |
| Expiry date | May 21, 2041 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61L2202/24
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A method for cleaning a medical instrument and for detecting residue thereon is provided in which method a non-sterile or conventionally sterilized medical instrument is exposed to pressure below 100 hPa, and, subsequently, exposed to at least one gas reactive to the residue.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.