Patent · US Active

Semiconductor wafer storage device

US11764089B2 · kind B2 · utility

0Cited by
7References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 12, 2021
Grant dateSep 19, 2023
Priority date
Expiry dateApr 12, 2041

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68721
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The present disclosure describes a method for substrate storage. The method can include respectively placing a plurality of substrates into a plurality of slots formed by a plurality of fin structures on a panel of a storage device. The method can further include binding each of the plurality of substrates to an corresponding one of the plurality of fin structures. The method can further include moving the storage device from a first location to a second location. The method can further include un-binding the plurality of substrates from the plurality of fin structures.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.