Device and method for producing high-concentration, low-temperature nitric oxide
US11766656B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 30, 2020 |
| Grant date | Sep 26, 2023 |
| Priority date | — |
| Expiry date | Nov 17, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2245/30
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
A device and method for forming NO-containing gas flow to treat a biological object is disclosed. The device may include an anode, a cathode, an interelectrode area between the cathode and the anode, an NO-containing gas flow outlet channel leading from the interelectrode area to a nozzle for directing and releasing the NO-containing gas flow from the device and a mechanism to adjust a relative position between the anode and the cathode to produce varying concentrations of NO. In addition, the device may include one or more features for interconnecting the various components to ensure proper and consistent assembly of the device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.