Systems and methods for a narrow band high transmittance interference filter
US11768439B2 · kind B2 · utility
0Cited by
11References
20Claims
0Family size
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Key dates
| Filing date | Aug 16, 2021 |
| Grant date | Sep 26, 2023 |
| Priority date | — |
| Expiry date | Sep 10, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70575
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure provides an interference filter, a lithography system incorporating an interference filter, and a method of fabricating an interference filter. The interference filter includes a transparent substrate having a front surface and a back surface, a plurality of alternating material layers formed over the front surface of the transparent substrate that form a bandpass filter, and an anti-reflective structure formed over the back surface of the transparent substrate. The alternating material layers alternate between a relatively high refractive index material and a relatively low refractive index material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.