Patent · US Active

Imprint apparatus and method of manufacturing article

US11768444B2 · kind B2 · utility

0Cited by
3References
5Claims
0Family size

Assignee

Inventor

Key dates

Filing dateNov 26, 2019
Grant dateSep 26, 2023
Priority date
Expiry dateSep 19, 2041

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An imprint apparatus that cures an imprint material on a substrate in a state where a mold is in contact with the imprint material includes a substrate holding unit having a plurality of holding regions that holds the substrate, and a control unit configured to control a pressure in each of the holding regions independently, wherein the control unit controls the pressure based on at least one of shape information and distortion information of the substrate, at least when the imprint material is cured.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.