Metal structures, devices, and methods
US11769729B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Jun 21, 2018 |
| Grant date | Sep 26, 2023 |
| Priority date | — |
| Expiry date | Jan 17, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2224/16235
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Provided herein are metal structures that may include a cobalt alloy, a nickel alloy, or nickel, as well as related devices and methods. The metal structures may be formed by chemical vapor deposition (CVD), and may include trace amounts of precursor materials used during the CVD process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.