Patent · US Active

Light augmented treatment method

US11771765B2 · kind B2 · utility

0Cited by
33References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 26, 2020
Grant dateOct 3, 2023
Priority date
Expiry dateOct 27, 2040

Classification

  • Technology area (CPC A)Human Necessities
  • CPC primaryA61K2800/81
  • WIPO fieldPharmaceuticals
  • WIPO sectorChemistry

Abstract

The present invention is directed to a method of treating skin and scalp comprising applying on the scalp or skin a composition comprising a scalp care active selected from the group consisting of 2-Pyridinol-N-oxide, a pyrithione or a polyvalent metal salt of pyrithione, one or more iron chelator having an A log P value of greater than or equal to 0.4 and mixtures therein; exposing the scalp and skin to electromagnetic radiation having wavelength from about 350 nm to about 500 nm and power from about about 0.1 mWatts/cm2 to about 1000 mWatts/cm2 and for a time period from about 2 seconds to about 5 minutes; wherein the antimicrobial treatment results in reduction of fungal growth as measured by the Fungal Growth Sensitivity Test of at least 50% compared to the dark sample.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.