Continuous spatial atomic layer deposition process and apparatus for applying films on particles
US11773487B2 · kind B2 · utility
0Cited by
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9Claims
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Key dates
| Filing date | Jun 14, 2016 |
| Grant date | Oct 3, 2023 |
| Priority date | — |
| Expiry date | Jun 14, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/458
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Continuous spatial atomic layer deposition is performed on a particulate substrate in a continuous reactor comprising a plurality of spatially separated, precursor dosing zones and a means for moving the particulate substrate spatially through the precursor dosing zones to apply an atomic layer deposition coating thereon. The precursor dosing zones may be used simultaneously.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.