Electromagnetic wave reflecting structure and manufacturing method thereof
US11777225B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 9, 2021 |
| Grant date | Oct 3, 2023 |
| Priority date | — |
| Expiry date | Jul 2, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01Q15/147
- WIPO fieldTelecommunications
- WIPO sectorElectrical engineering
Abstract
A method of manufacturing an electromagnetic wave reflecting structure includes the steps of presetting an operating frequency, a reflected wave pointing angle, an incident wave pointing angle, and an incident distance of an electromagnetic wave; obtaining an electromagnetic wave reflecting structure phase distribution of an electromagnetic wave reflecting structure according to the operating frequency, the reflected wave pointing angle, the incident wave pointing angle, and the incident distance; and arranging a plurality of reflecting elements on a substrate according to the electromagnetic wave reflecting structure phase distribution and a reflecting element phase curve of any one of the reflecting elements at the operating frequency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.