Method and apparatus for processing pattern pieces for fullness of clothes
US11783559B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Apr 18, 2022 |
| Grant date | Oct 10, 2023 |
| Priority date | — |
| Expiry date | Apr 18, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2219/2016
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for processing a pattern piece receives, as an input from a user, a selection of at least a portion of an outer line of a pattern piece to be processed among one or more pattern pieces included in a two-dimensional (2D) pattern of clothes, generates a template including a plurality of lines that divide an area set by the input, processes the template based on fullness settings set by the user for the pattern piece, processes the pattern piece based on the processed template, and outputs the processed pattern piece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.