Photocurable compositions for stereolithography, method of forming the compositions, stereolithography methods using the compositions, polymer components formed by the stereolithography methods, and a device including the polymer components
US11787878B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 3, 2022 |
| Grant date | Oct 17, 2023 |
| Priority date | — |
| Expiry date | Jun 3, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K2003/2237
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A photocurable composition for stereolithographic three-dimensional printing, wherein the photocurable composition comprises a photoreactive oligomer component comprising a hydrophobic oligomer comprising a photoreactive end group, a photoreactive monomer component comprising a photoreactive monomer having a photoreactive end group, and a photoinitiation composition comprising a photoinitiator; the photocurable composition has a viscosity of 250 to 10,000 centipoise at 22° C., determined using a Brookfield viscometer; and the photocured composition has a dielectric loss of less than 0.010, preferably less than 0.008, more preferably less than 0.006, most preferably less than 0.004, each determined by split-post dielectric resonator testing at 10 gigahertz at 23° C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.