Highly strong and tough photo-crosslinked hydrogel material and its preparation and application
US11787903B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 24, 2022 |
| Grant date | Oct 17, 2023 |
| Priority date | — |
| Expiry date | Nov 24, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08J2467/02
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
This invention provides preparations and applications of a highly strong and tough photo-crosslinked hydrogel material. The hydrogel materials are made from the o-nitrobenzyl phototriggers modified photosensitive polymer derivative, double bond groups modified polymer derivative, and photoinitiator. This invention significantly improved the properties of hydrogels by controlling the average molecular weight (arm length) of photosensitive poly (ethylene glycol) (with o-nitrobenzyl phototriggers modification) and its derivatives, and the molar ratio of o-nitrobenzyl phototriggers to poly (ethylene glycol) and its derivatives. Compared with prior technologies, the strength and/or toughness of the hydrogels in this invention are increased by one order of magnitude or even higher. These advances solve the problems of weak mechanical properties in current hydrogel materials and widen the applications of hydrogel materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.