Bore metrology methods and systems, and bore locating target assemblies for use therewith
US11794352B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 2021 |
| Grant date | Oct 24, 2023 |
| Priority date | — |
| Expiry date | May 11, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/45061
- WIPO fieldHandling
- WIPO sectorMechanical engineering
Abstract
A bore metrology method includes aligning a first structure, which defines an initial bore, with a second structure, which defines a pilot bore, such that the initial bore is partially obstructed by the second structure and the pilot bore is superimposed with the initial bore. The initial bore includes a bore locating target assembly within the initial bore, the bore locating target assembly having an optical target, the optical target having a reflector and an optical absorbing feature, the optical absorbing feature defining a pattern on the optical target. At least a portion of the reflector and at least a portion of the pattern are visible through the pilot bore. The method further includes imaging the portion of the reflector and the portion of the pattern that are visible through the pilot bore. The method further includes determining a centerline of the initial bore based on the imaging.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.