Resin particles and method for manufacturing resin particles
US11795302B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 25, 2021 |
| Grant date | Oct 24, 2023 |
| Priority date | — |
| Expiry date | Jun 19, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K2003/0812
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Resin particles include resin base particles and silica particles on surfaces of the resin base particles. The silica particles contain a quaternary ammonium salt and have hydrophobized surfaces. A difference (detection temperature A−detection temperature B) between a detection temperature A and a detection temperature B is more than 50° C., where the detection temperature A is a detection temperature from a pyrolysis product of the quaternary ammonium salt determined by pyrolysis mass spectrometry of the resin particles before cleaning, and the detection temperature B is a detection temperature from the pyrolysis product of the quaternary ammonium salt determined by pyrolysis mass spectrometry of the resin particles after cleaning.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.