Thin film deposited inorganic metal oxide as a selective substrate for mammalian cell culture and as an implant coating
US11795430B2 · kind B2 · utility
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13Claims
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Key dates
| Filing date | Nov 10, 2017 |
| Grant date | Oct 24, 2023 |
| Priority date | — |
| Expiry date | Sep 2, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC12N2535/10
- WIPO fieldBiotechnology
- WIPO sectorChemistry
Abstract
Disclosed herein is a material that may be useful as a coating for optical slides and medical implants. The material may aid or restrict grown of cells on a coating of the composite material. As such, there is provided a composite material having a substrate on the surface of which a coating layer of an amorphous metal oxide is formed. The metal oxide may be one or more of Ag2O, ZnO, ZrO2, TiO2, CuO, and Y2O3 and the coating layer may be from 5 to 100 nm thick and have a root mean square roughness of the coating surface is from 0.1 to 0.7 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.